Surface Cleanliness Martin Derks

Surface Cleanliness
Martin Derks
www.golighthouse.com
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Cleanroom Innovation 15 may 2012
Contamination Monitoring Solutions:
Contamination: "Any foreign material or energy that has a
detrimental effect on a product or process”
Monitoring Solutions for:
• Particles
• Temperature
•
Airborne Molecular
•
Pressure
Contamination
•
Air Velocity
•
Electrostatic Charge
•
Vibration
•
Electrostatic Discharge
•
Colony Forming Units
•
EMI
•
TOC,pH, Resistivity
•
Humidity
•
And more…
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Cleanroom Innovation 15 may 2012
Headquarters: Fremont, CA
Medford
Research and Development
Engineering
Pilot Production
Executive Management
Fremont
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Cleanroom Innovation 15 may 2012
Lighthouse Benelux Boven Leeuwen
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Cleanroom Innovation 15 may 2012
How Clean is Clean
"how clean is clean in relation to given
parameters?“
"how clean is clean enough?”
"how clean are the results of one cleaning
process compared to another cleaning
process?"
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Cleanroom Innovation 15 may 2012
Particles
Solid aerosol particles are all
around us.
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Cleanroom Innovation 15 may 2012
Distribution of Aerosol Particles
N/log(d) = 24.0d-3.08
 >20µm = Gravitational influence dominates
 <0.1µm = Electrostatic attraction and diffusion dominates
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Cleanroom Innovation 15 may 2012
Optical Particle Counting
Particle Counter ANNO 1880
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Cleanroom Innovation 15 may 2012
OK monitoring systemen
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Cleanroom Innovation 15 may 2012
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Activiteiten…….
Alarmering?
1800000,0
1600000,0
1400000,0
1200000,0
1000000,0
OK 8 0,5 micron
800000,0
Alarm
600000,0
400000,0
200000,0
0,0
Cleanroom Innovation 15 may 2012
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Schoonmaak probleem.
Alarmering?
OK 8 5,0 micron
140000,0
Deeltjes ≥ 5,0µm
120000,0
100000,0
80000,0
OK 8 Inleiding 5,0 micron
60000,0
40000,0
20000,0
0,0
Cleanroom Innovation 15 may 2012
Deeltjesneerslag
Afmeting in
µm
Gemiddelde valsnelheid ronde deeltjes in stilstaande
lucht
Valsnelheid in
mm/s
Valtijd over 1 m
tijd
0.5
0,01
25
uur
1
0,04
8
uur
5
0,7
25
min
10
3
6
min
20
12
83
sec
50
75
13
sec
100
300
3
sec
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Cleanroom Innovation 15 may 2012
Deeltjes depositie vs Oppervlakte reinheid
DDK
Deeltjesdepositie klasse
DDK is de toename van het aantal deeltjes per dm² per
uur op een testoppervlakte
Als basis voor de klasse is 1µm gekozen
DDK is hulpmiddel om risico van contaminatie
doorneerslag van deeltjes te bepalen:
RISICO: = bloodstellingstijd
DDK 100 betekent:
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10 deeltjes >10µm per dm² per uur
2 deeltjes >50µm per dm² per uur
1 deeltje> 100µm per dm² per uur
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Cleanroom Innovation 15 may 2012
Relative Size
Micron Scale
50
40
30
20
10
1
Human
Blood Cell
7 Micron
Andenovirus
0.075 Micron
Virus 0.1
Micron
E-Coli 0.5 Micron
Human Hair
50 -100 Micron
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35 Micron
Visible
Particles
Cleanroom Innovation 15 may 2012
Relative Size
Gas Molecules (AMC)
2-50 Å (.0002-.005µm)
0.3 µm
particle
0.1 µm
particle
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Cleanroom Innovation 15 may 2012
Personeel als grootse Vervuiler
★ 5 tot 10 miljoen huidcellen per dag (30 gram)
★ 2300 micro-organisme per cm²
★ ≥ 25µm vallende deeltjes
★ ≤ 5µm zwevende deeltjes
★ Tussen 5µm en ≥ 25µm overgangsgebied
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Cleanroom Innovation 15 may 2012
Surface Testing Methods: Non-Standard
Surfaces
★
Some Surfaces May Be Located in Hard to Reach
Areas
★
Some Parts May Be Too Small
★
Alternate Testing Methods May Be Used
1.
Tape Lift
2.
Part Rinse
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Cleanroom Innovation 15 may 2012
Deeltjes Depositie Klasse
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Cleanroom Innovation 15 may 2012
Surface Particle Cleanliness
Class ISO14644-9
SPC
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Cleanroom Innovation 15 may 2012
Witness plates
Deposited particles can have a greater impact on high-technology
manufacturing processes than airborne particles.
A witness plate is a flat, particle-free
object made from the same materials as
the product being manufactured (for
example: if you make ABS plastic
products, you should use ABS plastic
witness plates).
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Cleanroom Innovation 15 may 2012
wafer inspection system
> 0,1µm
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Cleanroom Innovation 15 may 2012
PartSense: Portable System
> 2,0µm
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Cleanroom Innovation 15 may 2012
Measuring Principle: Technique
• Illumination with
Glancing Light
• Fading out the
rough surface
• Imaging of the
Particles Using
Optics
• Image Recording
Using a Digital
Camera
• Analysis of the
Images Using
Digital Image
Processing
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Cleanroom Innovation 15 may 2012
Measuring Principle
> 25µm
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Cleanroom Innovation 15 may 2012
Surface Cleanliness
qualification method
GSA 07 4320
Grade 4 cat. 1, 2 & 3
UV-A Blacklight inspection GSA 07 0012
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Cleanroom Innovation 15 may 2012
Fluorescentie
UV light source
Camera
Filter
λ 375nm
λ
400/500
nm
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Cleanroom Innovation 15 may 2012
Application area :
 Grade 1, 2, 3, and 4
 Measurement area : 100 x 100 mm
 Every surface / substrate can be measured,
except fluorescent one’s. ( only when the tool can be
placed correctly, stray light should be eliminated ! )
 Roughness / reflectivity of the substrate is not an
issue.
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Cleanroom Innovation 15 may 2012
Functionality :
 P.A.C. ( Percentage of Area Covered )
 Size of the individual fluorescent particle’s on the surface
 Number of fluorescent particle’s on the surface.
 Length and width of the individual fluorescent particles
 Measurements are reproducible
 Ability to do a qualitative check of a surface’s particle
contamination and have immediate feedback OK or NOK
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Cleanroom Innovation 15 may 2012
UV Surface Particle Counter
- Produced by Lighthouse
- Developed by ASML
Only UV (λ 375nm) fluorescent particles
/ fibers can be seen with the tool.
(range is 400 / 900 nm light )
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Cleanroom Innovation 15 may 2012
Substrate is a Circuit Board with
Components.
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Cleanroom Innovation 15 may 2012
Circuit Board with Components,
Detail from previous slide.
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Cleanroom Innovation 15 may 2012
Product surface = 1 dm2
★ Specification = 4 particles/dm2
★ Product
★ 1dm2
Q
R
no action required
4 particles/dm2
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Cleaning needed
6 particles/dm2
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Cleanroom Innovation 15 may 2012
2
GSA 07 4320 vs Area size Product
surface
<
1
dm
Calculation = amount of detected particles x (1
★ Specification = 4 particles/dm2
★ Product 0.5 dm2
★ 1dm2
dm2 / product area)
eg 6 = 3 X (1/0.5) = 3 X 2
Q
R
no action required
4 particles/dm2
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Cleaning required
6 particles/dm2
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Cleanroom Innovation 15 may 2012
GSA 07 4320 vs Area size Product surface > 1 dm2
★ Specification = 4 particles/dm2
★ Product 4 dm2
★ 1dm2
R
no action required
4 particles/dm2
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Cleanroom Innovation 15 may 2012
GSA 07 4320 vs Area size Product surface > 1 dm2
★ Specification = 4 particles/dm2
★ Product 4 dm2
★ 1dm2
!
R
Q
CLEANIN
G
NEEDED!
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Cleanroom Innovation 15 may 2012
Particle Fallout prediction
Particle deposition on critical surfaces affect the functionality
of ASML scanners..
The simple mechanism of PFO spread at ASML cleanrooms:
Production
Activities
Particle
generation
Airborne
contamination
Nc
(particles/m3)
PFO rate
ṅ
Time & Space
dependent
(particles/m2/time)
deposition
The project involved experimental modeling of this
mechanism to establish a relationship between Nc and ṅ of the
form shown below:
n( x m,t)  (Nc )  t  (Distance)
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Cleanroom Innovation 15 may 2012
witnesswafers
Dust feeder
Particle
Counters
0,1µm
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Cleanroom Innovation 15 may 2012
Surface Particle Counter
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Cleanroom Innovation 15 may 2012
50µm Particles
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Vezel
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Cleanroom Innovation 15 may 2012
Resultaat metingen:
-
DNK (Deeltjes Neerslag Klasse)
ORK (Oppervlakte Reinheid Klasse)
Deeltjeslijst ( positie deeltje en eigenschappen)
Aantal deeltjes per klasse
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Cleanroom Innovation 15 may 2012
Surface Particle Probe Counter
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Cleanroom Innovation 15 may 2012
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Cleanroom Innovation 15 may 2012
Thank You
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Cleanroom Innovation 15 may 2012